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Facilities
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Micro/nano Fabrication
> He/Ne-ion Microscope
> DTL UV Litography
> DWL 66+
> EBL Raith 150
> EBL JBX-6300FS
> FIB/SEM DB235
> FIB/SEM Helios 600i
> UV Mask Aligner MA6
> 3D DLW
> Nano Imprint
> Laser Interference Lithography
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Dry Etching
> RIE Plasma80
> RIE NGP80
> Ion Beam Etching
> ICP Plasma100
> ICP Cobra
> Microwave Plasma
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Materials Growth
> TED DZ-300
> EBD FU-12PEB
> Thermal Evaporator
> Atomic Layer Deposition
> Electron Beam Evaporator
> UHV Thin Film Deposition
> MPCVD
> PECVD
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Charactorization
> SNOM
> Nano Indenter
> AFM
> Dual Probe SEM
> AFM/MFM
> PPMS
> Surface Profiler
> Ellipsometer
> Electro-chemical Stat.
> 3D Surface Analyzer
> Probe Stage
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Auxiliary
> Wire Bonder
> Rapid Annealing Process
扫描近场光学显微镜
Customized attoLIQUID-9T attoSNOM III & CFM Microscope
Lowest temperatures：1.8 K
Magnetic Field：9T @4.2K
Laser：630nm /1300nm
SNOM resolution：<200 nm
CFM resolution：<650nm
Contact person：
Shibing Tian
Techniques and Applications:
It can be used to directly observe the surface structure of nanostructures, and observe the near-field interaction between the incident light and the nanostructure under different low temperature and strong magnetic field environments.
