Facilities

DWL 66+ Maskless Lithography System
Technical specifications and key features:
  • Wafer size:up to 230mm (diameter)
  • Pattern area:up to 8 inches
  • Write model: 0.6,1.0 , 2.0, 4.0μm
  • 0.6μm laser write speed: 6mm2/min
  • 1μm laser write speed:39mm2/min
  • 2μm laser write speed:145mm2/min
  • 4μm laser write speed:500mm2/min
  • Laser wavelength:405nm
  • Laser energy:300mW
  • Alignment accuracy: 500nm
  • Grayscale: 256
  • Auto focus accuracy:100nm

Contact person:Haifang Yang

Techniques and Applications:
  • Photo mask
  • Direct writing
  • Metrology Function
  • Alignment Multi-Exposure
  • 3D Gray scale exposure