Facilities

微波等离子体化学气相沉积系统

MPCVD SDS5250S
Technical specifications and key features:

  • Microwave Source: 600-5000 W
  • Temperature range: 475-1475℃
  • Gas sources: H2,CH4, O2
  • Bias voltage: 0-600 V,0-1.7 A
  • Pressure: 200 Torr
Contact person:Junxiang Yan
 
Techniques and Applications:
MPCVD increases the reaction rate and lower the reaction temperature of the precursor through plasma.It is suitable for the preparation of high quality hard films and crystals with large area, good uniformity, high purity and good crystallization, such as large-sized gem-grade single crystal diamond, high-orientation diamond crystal, nano-crystalline diamond and carbon nanotubes/diamond-like carbon (DLC), etc.