Orion NanoFab He/Ne-ion Microscope
Technical specifications and key features:
He-ion system:
- Resolution: 0.5 nm
- Accelerting voltage: 10 KV-30 KV
- Ion beam current: 0.1 pA-20 pA
- Linewidth: ≤10 nm
Ne-ion system:
- Resolution: 1.9 nm
- Accelerting voltage: 10KV-25 kV
- Ion beam current: 0.1 pA-50 pA
- Linewidth: 10 - 30 nm
Ga-ion system:
- Resolution:3 nm@30 kV,1 pA
- Accelerting voltage: 1 KV-30 kV
- Ion beam current: 1 pA - 100 pA
- Linewidth: 30 nm
Contact person：Shibing Tian
Techniques and Applications:
The device can perform subnanometer to micron precision machining and high resolution imaging of materials as needed.The helium, neon, gallium triion beam and gas injection system are used to cut or deposit the sample materials with high precision, high efficiency and wide range according to the requirements, and to conduct in situ high resolution imaging.
