Facilities

PhableR 100S

PhableR 100S
Technical specifications and key features:
  • Resolution: 150 nm half-pitch (linear grating, in the “PHABLE” mode)
  • Pitch range: 300 nm-3 μm (linear grating, in the “PHABLE” mode)
  • Illumination uniformity: <3.0%
  • Mask format: 5”
  • Wafer size: up to 100 mm diameter
  • Resist thickness: >1 μm
  • Operation: Manual load-automatic exposure
  • Control: Touch panel

Contact person:Baogang Quan

 

Techniques and Applications:

In the 'PHABLE' mode, sub-micron linear gratings and 2D patterns such as hexagonal and square lattices are printed with high uniformity and quality. In the 'mask aligner' mode, micron scale features can be printed easily. The PhableR 100 tool provides unprecedented ability to print high resolution periodic structures in a low-cost photolithography system. It is similar to a conventional mask-aligner where a photoresist coated wafer is put in proximity to a mask and exposed by a beam of UV light. PhableR 100S is widely used to fabricate sub-micron linear gratings and 2D patterns for LED, display, solar cell, photonic crystals, plasmonic devices and so on.