Facilities

Nanoscribe Photonic Professional Direct Laser Writing System
Technical specifications and key features:
Laser power: 120 mW
Laser light wavelength: 780 nm
2D resolution: 120 nm
Z-axis resolution: 1 um
Sample stage movement range: 100mm X 100mm
Contact person:Wuxia Li

Techniques and Applications:
Based on the two-photon absorption induced polymerization, DLW system can be used to perform point to point, layer by layer exposure in different resists and polymers, to fabricate 1D, 2D (in micro and nanometer scale) and high aspect ratio 3D structures It has great potentials in photonics, biological, mechanical and medical research and applications.