Xiaorui Technology W355-S20 Laser Interference Lithography System
Technical specifications and key features:
Light working area: 0.8 mm×0.8 mm
The distance range of the interference line: 150nm~700nm
Stage moving axis: X, Y, Z and rotate
Contact person:Xiaoxiang Xia

Techniques and Applications:
Based on the UV light interference and beam shift, rotation technologies, W355-S20 can be used to fabricate various periodic structures on different substrates without the using of masks.